[News] Micron Reportedly Rules Out 4F² DRAM Scaling, Backs 6F² and 3D DRAM in Next-Gen Memory Roadmap
Micron is reportedly sticking with its 6F² DRAM architecture rather than adopting 4F², even as Chinese rival CXMT advances the alternative design. According to Nikkei, Scott DeBoer, Micron's president and chief technology and products officer, said during a recent technology webinar that 4F² is not 'on the roadmap right now' after more than 20 years of evaluation; the company plans to extend its 6F² architecture while developing 3D DRAM as a longer-term alternative. DeBoer explained that DRAM bit density is primarily determined by capacitor pitch rather than cell architecture alone, and pointed to fundamental scaling limitations, greater manufacturing complexity, and higher costs associated with 4F². Roadmap details: the 1γ (1-gamma) node is already in high-volume manufacturing and will underpin products introduced over the next 12 months; the next node, 1δ (1-delta), is expected to enter volume production in the second half of 2027, targeting a bit-density improvement in the mid-20% range, and will support next-generation memory products including DDR6, LPDDR6, HBM5, and vertical HBM (vHBM); the 1ε (1-epsilon) node is being developed with wafer bonding to improve bit density and support AI applications; for the subsequent 1ζ (1-zeta) and 1η (1-eta) nodes, the company is exploring High-NA EUV, new materials, and other innovations. 3D DRAM is placed between the 1ζ and 1η nodes in the roadmap, but development is proceeding in parallel with planar DRAM, with adoption depending on cost, manufacturing complexity, and device performance. On products, Micron is preparing DDR6 and LPDDR6, targeting twice the bandwidth of DDR5 and a 35% improvement in power efficiency over LPDDR5 respectively, with greater efficiency gains at certain densities; the company also plans a 1TB RDIMM following its recent sampling of a 512GB DDR5 RDIMM. For AI applications, Micron is advancing vHBM, which stacks memory directly on processing chips to deliver substantially higher bandwidth, developing it alongside standard and custom HBM products, although thermal management remains a challenge; packaging efforts include hybrid bonding, taller HBM stacks, and improved cooling technologies. For NAND, Micron plans to ramp its Generation 11 (G11) technology in the second half of 2027; G11 targets twice the bit density of G9 NAND, 1.5 times the I/O speed, and lower data-transfer energy consumption, and will adopt wafer-on-wafer bonding and feature more than 400 layers.
- Related manufacturers
- Micron
- Impact score
- 55 / 100, medium impact