Gas control speeds EUV wafer throughput
Imec demonstrated that increasing oxygen concentration during post-exposure bake can improve metal-oxide resist (MOR) photo-speed by 15-20%, potentially boosting EUV scanner throughput. This is a lab-stage process optimization using a specialized research tool (BEFORCE). Neutral: This is a long-term R&D milestone with no immediate impact on component supply, pricing, or trader decisions.
- Related manufacturers
- imec
- Impact score
- 10 / 100, low impact