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ASML 1000W light source to deliver 330wph EUV processing by 2030

What happened

ASML has developed a 1000W light source for its high-NA EUV machines, aiming to increase throughput from 220wph to 330wph by 2030. This is achieved by doubling the droplet rate and using a two-pulse laser approach. Neutral: This is a long-term R&D milestone with no immediate impact on component supply, pricing, or trading decisions.

Impact and signal

Low impactImpact score: 10/100

Affected components and suppliers

EUV Lithography Equipment

ASML

technology-roadmapcapacity-increase

Source and time

Source: Electronics Weekly · 2/23/2026 · View original source

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ASML 1000W light source to deliver 330wph EUV processing by 2030

What happened

Impact and signal

Affected components and suppliers

Source and time

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