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ASML extends Low NA EUV to 2031, ramps up High NA production

What happened

ASML extended its Low NA EUV tool production roadmap to 2031 and is ramping High NA EUV production, driven by stronger-than-expected Q1 2026 results underpinned by memory-chip demand. This indicates sustained long-term demand for advanced lithography tools from leading-edge logic and memory fabs. 关注: This dual-track capacity plan signals a stable supply of mature EUV nodes while accelerating next-gen capability, impacting the equipment procurement timeline for chipmakers.

Impact and signal

Medium impactImpact score: 60/100

Affected components and suppliers

EUV Lithography Equipment
capacity-expansionroadmap-updateequipment-supply

Source and time

Source: DigiTimes Asia · 4/16/2026 · View original source

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