NuAxiSemiconductor trade intelligence
ASML extends Low NA EUV to 2031, ramps up High NA production
What happened
ASML extended its Low NA EUV tool production roadmap to 2031 and is ramping High NA EUV production, driven by stronger-than-expected Q1 2026 results underpinned by memory-chip demand. This indicates sustained long-term demand for advanced lithography tools from leading-edge logic and memory fabs. 关注: This dual-track capacity plan signals a stable supply of mature EUV nodes while accelerating next-gen capability, impacting the equipment procurement timeline for chipmakers.
Impact and signal
Medium impactImpact score: 60/100
Affected components and suppliers
EUV Lithography Equipment
capacity-expansionroadmap-updateequipment-supply
Source and time
Source: DigiTimes Asia · 4/16/2026 · View original source
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