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ASML Targets More Than Doubling EUV Output Capacity by 2027

What happened

ASML targets producing at least 80 Low-NA EUV systems by 2027, doubling last year's 44 units, to address AI-driven demand surges and prevent supply bottlenecks.

Impact and signal

Medium impactImpact score: 65/100

Affected components and suppliers

EUV Lithography SystemsLow-NA EUV systemsDUV systems

ASMLCarl Zeiss

NXE:3800E

capacity_expansionsupply_chaineuv

Source and time

Source: The Elec · 4/16/2026 · View original source

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ASML looks to increase prices of its Low-NA EUV tools beyond existing productivity-based model — company wants to capture the value of all the advantages its tools offer, not just wafer throughput improvementsTom's Hardware · 7/17/2026
ASML's planned Low-NA EUV machine price hikes reportedly frustrate TSMC — lithography machine maker comes knocking to make bank on TSMC's profitable fabs, potentially costing the Taiwanese chipmaker billionsTom's Hardware · 7/17/2026
ASML denies US government report that its EUV chipmaking tool was shipped to China — says 'rumors' are 'inaccurate and damaging to our reputation'Tom's Hardware · 6/19/2026
[News] China Curbs Helium Exports Amid Global Supply Risks; Critical for EUV and Advanced ChipmakingTrendForce · 7/12/2026
[News] SK hynix Commits $8B to ASML EUV Equipment by 2027 in Push for AI Memory DominanceTrendForce · 3/23/2026
[News] ASML Expects First High-NA EUV Memory, Logic Products Within Months Amid TSMC’s Cost-Driven DelayTrendForce · 5/19/2026

ASML Targets More Than Doubling EUV Output Capacity by 2027

What happened

Impact and signal

Affected components and suppliers

Source and time

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