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[News] U.S. Proposes to Tighten China Chip Tool Exports; Targets DUV to Slow SMIC and Peers’ Advanced Node Push

What happened

US lawmakers propose the MATCH Act to restrict DUV immersion lithography and cryogenic etching tools to China within 150 days. This policy shift is projected to reduce ASML's China market share from 33% to 20% by 2026. Bullish for global equipment suppliers facing supply constraints.

Impact and signal

High impactImpact score: 90/100

Affected components and suppliers

DUV Lithography SystemsCryogenic Etching ToolsSemiconductor Manufacturing Equipment
ASMLTokyo ElectronSMICHua Hong
export-controlsupply-shortagepolicyASML

Source and time

Source: TrendForce · 4/8/2026 · View original source

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