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[News] U.S. Proposes to Tighten China Chip Tool Exports; Targets DUV to Slow SMIC and Peers’ Advanced Node Push
What happened
US lawmakers propose the MATCH Act to restrict DUV immersion lithography and cryogenic etching tools to China within 150 days. This policy shift is projected to reduce ASML's China market share from 33% to 20% by 2026. Bullish for global equipment suppliers facing supply constraints.
Impact and signal
High impactImpact score: 90/100
Affected components and suppliers
DUV Lithography SystemsCryogenic Etching ToolsSemiconductor Manufacturing Equipment
export-controlsupply-shortagepolicyASML
Source and time
Source: TrendForce · 4/8/2026 · View original source
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