Microsoft-backed start-up raises $40 million for helium atom beam lithography that could print chips at atomic resolution — 0.1nm beam is 135 times narrower than ASML's EUV light
Norwegian start-up Lace Lithography raised $40 million to develop helium atom beam lithography (BEUV), targeting 0.1nm resolution by 2029, bypassing the diffraction limits of current EUV systems.
- Related manufacturers
- Lace Lithography, Microsoft, ASML
- Impact score
- 10 / 100, low impact