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Microsoft-backed start-up raises $40 million for helium atom beam lithography that could print chips at atomic resolution — 0.1nm beam is 135 times narrower than ASML's EUV light

What happened

Norwegian start-up Lace Lithography raised $40 million to develop helium atom beam lithography (BEUV), targeting 0.1nm resolution by 2029, bypassing the diffraction limits of current EUV systems.

Impact and signal

Low impactImpact score: 10/100

Affected components and suppliers

Lace LithographyMicrosoft ASML

fundinglithographyfuture-tech

Source and time

Source: Tom's Hardware · 3/24/2026 · View original source

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Microsoft-backed start-up raises $40 million for helium atom beam lithography that could print chips at atomic resolution — 0.1nm beam is 135 times narrower than ASML's EUV light

What happened

Impact and signal

Affected components and suppliers

Source and time

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