Vishay selects Aixtron’s G10-SiC multi-wafer batch technology
Vishay Intertechnology has selected Aixtron's G10-SiC multi-wafer CVD epitaxy platform for its in-house silicon carbide production at its Newport fab in Wales. This equipment supports dual wafer sizes (9x150mm or 6x200mm) for power device manufacturing. Neutral: This is a long-term capacity build-out for a specialized process, with no immediate impact on market supply, pricing, or inventory of discrete components.
- Related manufacturers
- Vishay Intertechnology Inc, Aixtron SE
- Impact score
- 10 / 100, low impact