China's 90%-localized EUV light source debuts at 15W, exposing the gap to commercial chipmaking

What happened

Chinese semiconductor technology start-up Langdao Silex (Shanghai) Technology has publicly unveiled an extreme ultraviolet (EUV) light source prototype with a claimed 90% localization rate and 15W output power. The source does not state the cause. The company frames this as progress in China's efforts to develop domestic lithography technology; however, the system remains three to five years from mass production, with output power and long-term stability posing major engineering challenges. The event is a prototype debut and does not represent mass production or commercial use.

Impact and signal

Affected components and suppliers

Source and time

Source: DigiTimes Asia · 10/15/2026 · View original source