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[News] Korean Expert Predicts “Chinese ASML” by 2030; Hua Hong Said to Join SMIC at 7nm
What happened
A Korean academic predicts China could develop a domestic EUV lithography tool by 2030, while Reuters reports Huali Microelectronics (Hua Hong Group) is developing a 7nm process line with initial capacity of several thousand wafers per month targeted for end-2026. These developments represent long-term R&D and capacity expansion efforts within China's semiconductor ecosystem. Neutral: No immediate trading impact; these are multi-year technical and capacity goals with unproven commercial viability.
Impact and signal
Low impactImpact score: 15/100
Affected components and suppliers
EUV LithographyDUV Lithography
rd-milestonecapacity-expansionchina-domestic
Source and time
Source: TrendForce · 3/15/2026 · View original source
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