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University of Michigan develops first PEALD-grown ScAlN thin film layers on 3D surfaces
What happened
University of Michigan researchers have demonstrated the first plasma-enhanced atomic layer deposition (PEALD) growth of scandium aluminium nitride (ScAlN) thin films on 3D surfaces, funded in part by the Army Research Office. This is a materials science R&D milestone that could enable more complex piezoelectric MEMS and RF filter designs in the future. Neutral: This is a long-term process development with no immediate impact on component supply, pricing, or trading decisions.
Impact and signal
Low impactImpact score: 8/100
Affected components and suppliers
ScAlN Piezoelectric FilmsMEMSRF Filters
R&Dmanufacturing-techpiezoelectric
Source and time
Source: Semiconductor Today · 10/21/2025 · View original source
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