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Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)

What happened

Researchers at the Chinese Academy of Sciences, Jilin University, the State Key Laboratory of Advanced Manufacturing for Optical Systems, and the University of Chinese Academy of Sciences published a technical paper titled "Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance," investigating an alternative Pt-W alloy as a low-n EUV mask absorber and evaluating its film properties and imaging performance. The study indicates the Pt-W alloy shows potential for thinner High-NA EUV mask absorbers. This is a research-stage result; the source does not state any commercialization or production arrangements, nor does it state the cause.

Impact and signal

Low impactImpact score: 20/100

Affected components and suppliers

Pt-W alloy EUV mask absorber
Chinese Academy of SciencesJilin UniversityState Key Laboratory of Advanced Manufacturing for Optical SystemsUniversity of Chinese Academy of Sciences
EUVmask absorberPt-W alloyresearch paperHigh-NA

Source and time

Source: Semiconductor Engineering · 10/25/2026 · View original source

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