Siemens transforms computational lithography for next-generation AI semiconductors with NVIDIA cuLitho

What happened

Siemens announced significant advances in its collaboration with NVIDIA for computational lithography: by integrating NVIDIA cuLitho, a CUDA-X library for GPU-accelerated computational lithography, with Calibre manufacturing software, the collaboration delivers up to 12x acceleration for full-chip optical proximity correction (OPC) workloads and at least 10x acceleration for key lithography simulation workloads; verified engineering data supports simulation speed-ups ranging from at least 10x to 17x for key workloads. It enables practical full-chip optimization of photomasks for High-NA EUV lithography using advanced methods such as Inverse Lithography Technology (ILT), addressing the critical runtime and complexity challenges of leading-edge patterning for AI compute and memory devices. Siemens says this can help reduce simulation runtimes, identify lithographic hotspots earlier, improve process margins before tapeout, and support the deployment of new AI silicon. The source does not state any impact on specific prices or supply-demand conditions.

Impact and signal

Affected components and suppliers

Source and time

Source: EE Journal · 10/15/2026 · View original source