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Sumitomo Electric develops N-polar GaN HEMT using Hf-based gate dielectric
What happened
Sumitomo Electric has developed an N-polar GaN HEMT using a novel Hf-based gate dielectric, presented at the 2022 IEEE BCICTS. This is a research milestone targeting future high-capacity, high-speed post-5G communications infrastructure. The announcement is a long-term R&D development with no immediate impact on component supply, pricing, or production capacity.
Impact and signal
Low impactImpact score: 8/100
Affected components and suppliers
GaN HEMT
Sumitomo Electric Industries Ltd
R&DGaNpost-5G
Source and time
Source: Semiconductor Today · 10/27/2022 · View original source
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