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SUSS MicroTec launches 300mm imprint platform
What happened
SÜSS MicroTec SE has launched its new MA12 Gen3 mask aligner, extending its imprint technology to 300mm wafers. The tool combines photolithography, nano-imprint, and wafer-level stacking capabilities. Neutral: This is a capital equipment launch for semiconductor manufacturing, with no immediate or direct impact on component supply, demand, or pricing.
Impact and signal
Low impactImpact score: 10/100
Affected components and suppliers
SÜSS MicroTec SE
equipmentlithography
Source and time
Source: Semiconductor Today · 11/17/2022 · View original source
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