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ASM launches dual-chamber PE2O8 single-wafer 8”-wafer silicon carbide epi system
What happened
ASM International launched its dual-chamber PE2O8 single-wafer SiC epitaxy system at ICSCRM 2024, targeting the power device segment with claims of low defectivity and high uniformity. This equipment introduction aims to support the broader adoption of SiC technology by improving throughput and lowering cost of ownership. Neutral: This is a long-term capacity enabler for SiC wafer supply, with no immediate impact on trading prices or component availability.
Impact and signal
Low impactImpact score: 15/100
Affected components and suppliers
SiC Epitaxy EquipmentSiC Wafers
ASM International N.V.
equipment-launchtechnologySiC
Source and time
Source: Semiconductor Today · 9/30/2024 · View original source
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