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IBM, Lam Research Focus High-NA EUV on Sub-1-nm Nodes
What happened
IBM and Lam Research announced a five-year R&D agreement focused on developing materials and processes for sub-1nm nodes using High-NA EUV lithography. This is a long-term research collaboration targeting future chip manufacturing technologies. Neutral: No immediate impact on component supply, pricing, or production capacity.
Impact and signal
Low impactImpact score: 8/100
Affected components and suppliers
High-NA EUV lithography
IBMLam Research
rdpartnershipprocess-node
Source and time
Source: EE Times · 3/13/2026 · View original source
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