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IBM and Lam's new partnership paves the way toward sub-1nm logic using High-NA EUV — Albany lab to pioneer dry resist process integration

What happened

IBM and Lam Research announced a five-year collaboration to develop sub-1nm logic using High-NA EUV and Lam's Aether dry resist technology at Albany NanoTech. This partnership aims to solve stochastic noise issues in wet chemistry resists by using vapor-phase deposition. The deal is bullish for Lam Research's equipment and materials business as it secures long-term R&D contracts for next-generation lithography.

Impact and signal

Low impactImpact score: 10/100

Affected components and suppliers

partnershipeuvdry-resistsub-1nm

Source and time

Source: Tom's Hardware · 3/12/2026 · View original source

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