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AlixLabs showcasing latest APS findings at SPIE Advanced Lithography + Patterning

What happened

AlixLabs will present results from using its Atomic Layer Etching Pitch Splitting (APS) technology to etch structures corresponding to 3nm processes on Intel-provided test silicon at the SPIE Advanced Lithography + Patterning conference. This is a research and development milestone demonstrating a potential future patterning technique. Neutral: This is a long-term R&D announcement with no immediate impact on component supply, pricing, or production capacity.

Impact and signal

Low impactImpact score: 10/100

Affected components and suppliers

Logic/Processor

Intel

lithographyetchingR&D

Source and time

Source: Semiconductor Today · 2/10/2025 · View original source

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AlixLabs showcasing latest APS findings at SPIE Advanced Lithography + Patterning

What happened

Impact and signal

Affected components and suppliers

Source and time

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