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Sapphire Surface Modification Enables Wafer-Scale 2D Semiconductor Growth (Peking U., CAS et al.)

What happened

Researchers from Peking University and CAS developed a surface modification strategy for sapphire to enable wafer-scale growth of monolayer WS2 and MoS2. This technique uses homo-metal-element (W/Mo and Al) modification on commercial C/M sapphire. The impact is neutral for current trading as it is a research milestone.

Impact and signal

Low impactImpact score: 10/100

Affected components and suppliers

2D SemiconductorsMoS2WS2Sapphire Substrates
Peking UniversityChinese Academy of Sciences
R&D2D MaterialsSapphireEpitaxy

Source and time

Source: Semiconductor Engineering · 8/28/2026 · View original source

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